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... >99.5% Density 6.51g/cm3 Standard ASTM B550 Size According to your demand Shape Round disc/target Surface Polished MOQ 1pc Custom Yes, we can OEM,ODM Package Plywood case Country of origin Shaanxi,China ...
... >99.5% Density 6.51g/cm3 Standard ASTM B550 Size According to your demand Shape Round disc/target Surface Polished MOQ 1pc Custom Yes, we can OEM,ODM Package Plywood case Country of origin Shaanxi,China ... more
Brand Name:PRM
Model Number:Custom
Place of Origin:China
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...Targets The Key to Successful Thin Film Deposition We offer Titanium targets for all major PVD systems, and can be tailored for applications ranging from ultra-high performance to minimal-cost needs. Titanium Targets can be made in purities ranging from 3N to 5N+. Through control of the target metallurgy, oxygen content, surface finish and assembly technology, we offer titanium targets...
...Targets The Key to Successful Thin Film Deposition We offer Titanium targets for all major PVD systems, and can be tailored for applications ranging from ultra-high performance to minimal-cost needs. Titanium Targets can be made in purities ranging from 3N to 5N+. Through control of the target metallurgy, oxygen content, surface finish and assembly technology, we offer titanium targets... more
Brand Name:Changsheng
Model Number:Thin Film Deposition Titanium Targets
Place of Origin:China
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...smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Specification Composition Ti Purity CP Grade 2 (99.5%), CP Grade 1 (99.7%), 3N5 (...
...smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Specification Composition Ti Purity CP Grade 2 (99.5%), CP Grade 1 (99.7%), 3N5 (... more
Brand Name:JINXING
Model Number:Titanium Sputtering Target
Place of Origin:China
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...Film Deposition Arc Ion Plating Pvd Coating Machine A Physical Vapor Deposition coating machine is a sophisticated piece of industrial equipment used to apply thin, uniform, and durable coatings onto various substrates. Utilizing vacuum conditions, the process involves transforming a solid coating material into a vapor state, which then condenses onto the target...
...Film Deposition Arc Ion Plating Pvd Coating Machine A Physical Vapor Deposition coating machine is a sophisticated piece of industrial equipment used to apply thin, uniform, and durable coatings onto various substrates. Utilizing vacuum conditions, the process involves transforming a solid coating material into a vapor state, which then condenses onto the target... more
Brand Name:JXS
Place of Origin:China
Certification:CE
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... substrates. Molybdenum sputtering targets exhibit excellent thermal and electrical conductivity properties. They are known for their high melting point, good adhesion, and uniform film deposition. Molybdenum targets are widely used in industries such
... substrates. Molybdenum sputtering targets exhibit excellent thermal and electrical conductivity properties. They are known for their high melting point, good adhesion, and uniform film deposition. Molybdenum targets are widely used in industries such more
Brand Name:Hypersolid Metal
Place of Origin:China
Minimum Order Quantity:Negotiate
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.... These products are primarily used in thin-film solar energy, flat-panel displays, optical coatings, semiconductors, and military applications. Our company collaborates with numerous renowned universities and ...
.... These products are primarily used in thin-film solar energy, flat-panel displays, optical coatings, semiconductors, and military applications. Our company collaborates with numerous renowned universities and ... more
Brand Name:ZG
Model Number:MS
Place of Origin:China
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...Target Titanium Target Silver Target Sputtering to Coating Sputtering is a widely used deposition technique for creating thin films and coatings on various substrates. In this process, material from a sputtering target (usually in the form of a metal or alloy) is bombarded with high-energy ions in a vacuum, causing atoms to be ejected and deposit...
...Target Titanium Target Silver Target Sputtering to Coating Sputtering is a widely used deposition technique for creating thin films and coatings on various substrates. In this process, material from a sputtering target (usually in the form of a metal or alloy) is bombarded with high-energy ions in a vacuum, causing atoms to be ejected and deposit... more
Brand Name:LHTi
Model Number:Titanium Target
Place of Origin:Baoji, Shaanxi, China
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...target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target...
...target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target... more
Brand Name:FGD
Model Number:fgd t-002
Place of Origin:China
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PVD Ion plating/coating machine,Thin Film Coating Machine APPLICATION It can be used to coat metal film, titanium nitride, titanium carbide, and zirconium nitride, chromium nitride and titanium, nickel, chromium, copper , and other compounds film, multi-...
PVD Ion plating/coating machine,Thin Film Coating Machine APPLICATION It can be used to coat metal film, titanium nitride, titanium carbide, and zirconium nitride, chromium nitride and titanium, nickel, chromium, copper , and other compounds film, multi-... more
Brand Name:ROYAL
Model Number:RTAC
Place of Origin:China
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...deposition systems Product Description It can be used to coat metal film, titanium nitride, titanium carbide, and zirconium nitride, chromium nitride and titanium, nickel, chromium, copper , and other compounds film, multi-layer super-hard film, nitrogen-doped titanium film and the alloy film ( TiN, TiC, TiCN, TiAlN, CrN, Cu, Au, Al2O3and other decorative films...
...deposition systems Product Description It can be used to coat metal film, titanium nitride, titanium carbide, and zirconium nitride, chromium nitride and titanium, nickel, chromium, copper , and other compounds film, multi-layer super-hard film, nitrogen-doped titanium film and the alloy film ( TiN, TiC, TiCN, TiAlN, CrN, Cu, Au, Al2O3and other decorative films... more
Brand Name:DST
Model Number:MCA-900
Place of Origin:CHINA
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...Tube Target used for thin film solar cells new energy Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass...
...Tube Target used for thin film solar cells new energy Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass... more
Brand Name:Sanhui
Model Number:Mo1
Place of Origin:Henan, China
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...Target For Magnetron Sputtering Coating PVD Arc Ion Plating 1. Information of Tungsten Molybdenum Alloy Plate Target For PVD: Tungsten-molybdenum alloy plate target is a high-purity tungsten and molybdenum alloy material, which is widely used in various thin film deposition...
...Target For Magnetron Sputtering Coating PVD Arc Ion Plating 1. Information of Tungsten Molybdenum Alloy Plate Target For PVD: Tungsten-molybdenum alloy plate target is a high-purity tungsten and molybdenum alloy material, which is widely used in various thin film deposition... more
Brand Name:PRM
Model Number:custom
Place of Origin:China
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... air molecules from interfering with film deposition. 2. Plasma Excitation: An inert gas (such as argon) is introduced into the chamber, and a high-voltage electric field is applied between the target (coating material, e.g., aluminum, titanium, ITO) and
... air molecules from interfering with film deposition. 2. Plasma Excitation: An inert gas (such as argon) is introduced into the chamber, and a high-voltage electric field is applied between the target (coating material, e.g., aluminum, titanium, ITO) and more
Brand Name:Lion King
Place of Origin:Guangdong
Certification:CE
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.... A cermet film layer and a glass-over are deposited on a high grade (Al2O3) ceramic substrate with its prepared inner contacts on both sides. A special laser is used to achieve the target value by smoothly fine trimming the resistive layer without
.... A cermet film layer and a glass-over are deposited on a high grade (Al2O3) ceramic substrate with its prepared inner contacts on both sides. A special laser is used to achieve the target value by smoothly fine trimming the resistive layer without more
Brand Name:Vishay
Model Number:RCA06032K00JNEA
Place of Origin:USA
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... Coin operated machine is_customized Yes Weight 100kg LCD 22 inch Payment terms T/T, 30% deposit, 70% paid before shipping; cash before delivery Packaging details Stretch film inside, wooden case outside Port Guangzhou, Shenzhen, HongKong Leading time 7
... Coin operated machine is_customized Yes Weight 100kg LCD 22 inch Payment terms T/T, 30% deposit, 70% paid before shipping; cash before delivery Packaging details Stretch film inside, wooden case outside Port Guangzhou, Shenzhen, HongKong Leading time 7 more
Brand Name:EPARK
Model Number:shooting game machine
Place of Origin:Guangzhou , China
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..., melting equipment, oil industry etc.high purity, ≥99.95%;high density, 99% or higher;O content less than 20ppm.Sputtering target is a bombarding materials for preparing electronic thin film materials by physical vapor deposition. It is mainly used
..., melting equipment, oil industry etc.high purity, ≥99.95%;high density, 99% or higher;O content less than 20ppm.Sputtering target is a bombarding materials for preparing electronic thin film materials by physical vapor deposition. It is mainly used more
Brand Name:Sifon
Model Number:tungsten wire
Place of Origin:China
