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Titanium Plate Sputtering Target high purity 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Products include low oxygen ultra-high purity titanium material, high-end titanium alloy material, production ...
Titanium Plate Sputtering Target high purity 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Products include low oxygen ultra-high purity titanium material, high-end titanium alloy material, production ... more
Brand Name:JINXING
Model Number:Titanium Sputtering Target
Place of Origin:China
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...Sputtering Target Titanium Sputtering Titanium Sputtering Target to High Purity Sputtering in Medical Applications In the rapidly advancing field of medical technology, the demand for high-quality materials is paramount. Among these materials, Grade 5 and Grade 7 titanium sputtering targets stand out for their exceptional properties and versatility. These high purity PVD (Physical Vapor Deposition) titanium sputtering targets
...Sputtering Target Titanium Sputtering Titanium Sputtering Target to High Purity Sputtering in Medical Applications In the rapidly advancing field of medical technology, the demand for high-quality materials is paramount. Among these materials, Grade 5 and Grade 7 titanium sputtering targets stand out for their exceptional properties and versatility. These high purity PVD (Physical Vapor Deposition) titanium sputtering targets more
Brand Name:LHTi
Model Number:Titanium Target
Place of Origin:Baoji, Shaanxi, China
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering more
Brand Name:Sanhui
Model Number:Mo1
Place of Origin:Henan, China
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W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum...
W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum... more
Model Number:Tungsten Sputtering Target
Minimum Order Quantity:Negotiate
Price:Negitionable
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...Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target...
...Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target... more
Brand Name:Feiteng
Model Number:Titanium tube target
Place of Origin:Baoji, Shaanxi, China
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Description Titanium Sputtering Targets are high-purity titanium materials used in physical vapor deposition (PVD) and magnetron sputtering processes. Titanium is a lustrous, silvery-white metal known for its high strength-to-weight ratio, low density (4....
Description Titanium Sputtering Targets are high-purity titanium materials used in physical vapor deposition (PVD) and magnetron sputtering processes. Titanium is a lustrous, silvery-white metal known for its high strength-to-weight ratio, low density (4.... more
Brand Name:Changsheng
Model Number:ASTM
Place of Origin:China
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...Titanium Alloy Pvd Target For Medical / Industrial Coating Specification: Item Name GR1 GR2 GR5 Titanium Alloy pvd Targets/Titanium Sputtering Targets for coating Material Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Standard ASTM B381; ASTM F67, ASTM F136 size 1. Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate...
...Titanium Alloy Pvd Target For Medical / Industrial Coating Specification: Item Name GR1 GR2 GR5 Titanium Alloy pvd Targets/Titanium Sputtering Targets for coating Material Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Standard ASTM B381; ASTM F67, ASTM F136 size 1. Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate... more
Brand Name:MH
Model Number:MHT7263
Place of Origin:Baoji,China
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... Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium ...
... Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium ... more
Brand Name:GNEE
Model Number:TiP0001
Place of Origin:Henan
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...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target...
...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target... more
Brand Name:FGD
Model Number:fgd t-002
Place of Origin:China
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...Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets...
...Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets... more
Brand Name:PRM
Model Number:custom
Place of Origin:China
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... Grade Gr1, Gr2, Gr3, Gr4, Gr7, Gr9,Gr12 color metal grey, or customized according to material feature Titanium has low weight, excellent high strength and corrosion resistance character technic hot rolling,
... Grade Gr1, Gr2, Gr3, Gr4, Gr7, Gr9,Gr12 color metal grey, or customized according to material feature Titanium has low weight, excellent high strength and corrosion resistance character technic hot rolling, more
Brand Name:Sifon
Model Number:5mm*W*L
Place of Origin:China
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...Sputtering Target Natural quartz glass has excellent transmission in the UV range. Synthetic quartz glass (fused silica) is of the highest purity due to the special manufacturing process. This quartz glass has an extremely high purity and few inclusions and is therefore particularly advantageous for optical applications. We supply quartz glass plates...
...Sputtering Target Natural quartz glass has excellent transmission in the UV range. Synthetic quartz glass (fused silica) is of the highest purity due to the special manufacturing process. This quartz glass has an extremely high purity and few inclusions and is therefore particularly advantageous for optical applications. We supply quartz glass plates... more
Brand Name:ZCQ
Model Number:ZCQ
Place of Origin:China
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...plate, Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target...
...plate, Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target... more
Brand Name:HMD
Model Number:NONE
Place of Origin:CHN
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...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for
...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for more
Minimum Order Quantity:500g
Packaging Details:Custom Packaging
Delivery Time:45-60 Workdays
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... thin-film coatings onto various substrates. The process occurs in a high-vacuum chamber where a solid coating material is vaporized and then deposited onto the target surface through condensation. Common PVD techniques include sputtering and evaporation.
... thin-film coatings onto various substrates. The process occurs in a high-vacuum chamber where a solid coating material is vaporized and then deposited onto the target surface through condensation. Common PVD techniques include sputtering and evaporation. more
Brand Name:JXS
Place of Origin:China
Certification:CE
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ...
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ... more
Brand Name:TOBO
Model Number:NI 200
Place of Origin:China
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and
... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and more
Brand Name:ZG
Model Number:MS
Place of Origin:CHINA
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Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ... more
Brand Name:TORICH
Model Number:304L
Place of Origin:China
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...
Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder... more
Brand Name:PRM
Model Number:custom
Place of Origin:China
